Tel:+86 769-83030999

Semiconductor Series

Semiconductor Series - Graphene Equipment

Semiconductor Series - Graphene Equipment

Detail

Graphene、 Nano-materials CVD



Application: The machine is mainly used for graphene 、 nano-material technology coating、poly-silicon, Silicon nitride, diffusion, and oxidation and annealing process.

Key Technical Parameters
Structure type Horizontal, Single pipes or pipe systems, Automatic control
Wafer Size 2-8″
Feed mode Automatic quartz sliding cantilever boat, auto feed quartz boat with wafers to process chamber
The highest temperature 1050℃
Working temperature 400℃~850℃Continuously adjustable
Single-point temperature stability 400℃~850℃≤±0.5℃/24h
Ultimate  vacuum Better than 1Pa
Pumping speed To base vacuum<15Min.
Working pressure range 5Pa Torr 1×105Pa Continuously adjustable
Power supply 3 wires-5 lines, 50Hz
Cooling Wafer 2~4Kgf/cm²,8L/min;

Copyright © 2019 Dong Guan Plasma Electronic Equipment Co., Ltd