Semiconductor Series - Graphene Equipment

Graphene、 Nano-materials CVD



Application: The machine is mainly used for graphene 、 nano-material technology coating、poly-silicon, Silicon nitride, diffusion, and oxidation and annealing process.

Key Technical Parameters

Structure type	Horizontal, Single pipes or pipe systems, Automatic control
Wafer Size	2-8″
Feed mode	Automatic quartz sliding cantilever boat, auto feed quartz boat with wafers to process chamber
The highest temperature	1050℃
Working temperature	400℃~850℃Continuously adjustable
Single-point temperature stability	400℃~850℃≤±0.5℃/24h
Ultimate  vacuum	Better than 1Pa
Pumping speed	To base vacuum＜15Min.
Working pressure range	5Pa Torr 1×105Pa Continuously adjustable
Power supply	3 wires-5 lines, 50Hz
Cooling Wafer	2~4Kgf/cm²，8L/min;