Solar Cell Series-Diffusion Furnace_Dong Guan Plasma Electronic Equipment Co., Ltd.

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Solar Cell series

Solar Cell Series-Diffusion Furnace

Detail

Closed Tube & Soft Landing Diffusion Furnace
Product Introduction
◆Close-tube phosphorus diffusion、Boron diffusion, with exhaust gas, expelled from pipe collector and cooler. And various process gases inject into tube separately and spraying. The chose-tube diffusion process is completely free from outside interference with full protection on process quality;
◆Automatic temperature and process control, and all elements are imported.
◆Wafer loading with characteristics: all digital control, more reliable, credibility, steady, non-crawling, along phenomenon, high anchor precision, long longevity, big capacity and three-dimensional automatic adjustment function.
◆Can be used for Annealing Process after Implant.

Key Technical Parameters

Working temperature	600-1100℃
Length of constant temp. Zone	1400mm
Precision of temp. zone(test with static closed tube)	800℃＜working temp.＜1100℃：±0.5℃ 600℃≤working temp.≤800℃：±1℃
Single point temperature stability (tested with static closed tube)	800℃＜working temp.＜1100℃：±0.5℃/24h 600℃≤working temp.≤800℃：±1℃/24h;
Temperature ramping	Max controllable speed of temperature increase（600-1150℃）:15℃/min Max controllable speed to temp. decrease（1150-600℃）：8℃/min
Air flow setting precision	±1%FS
Bubble-tightness of gases system	1×10^-7Pa.m³/S
Travel length of automatic loader	~2000mm,Velocity: 5~1000mm/min SiC paddle load capacity, 20kg;
Wafer loading qty	540 pieces/tube; 1050 pieces/tube;
Purification workstation	Class 100(In class 10000 Fab);
3-phase-5-wire system	380V±10%，50Hz±10%Hz
Cooling Water	2~4Kgf/cm²，~8L/min
Configurable part	Quantity of process tube: 1~5 tubes/set. Automatic loader.